Imaging Equivalent Oxide Thickness of Dielectric Oxide Films by Scanning Capacitance Microscopy

Mao-Nan Chang

講演情報

Oral Session

D. Electronic » [D-1] Synthesis, Processing and Characterization of Nanoscale and Functional Oxide Films -7th E-MRS & MRS-J Bilateral Symposium

[D1-O202] Oral 202

2023年12月12日(火) 14:00 〜 16:05 Session 11 (Room B-2)

Chair: Nobuyuki Iwata (Nihon University), Hiroshi Funakubo (Tokyo Institute of Technology)

14:50 〜 15:05

[D1-O202-02] Imaging Equivalent Oxide Thickness of Dielectric Oxide Films by Scanning Capacitance Microscopy

*Mao-Nan Chang¹, Yu-Hsun Hsueh², Chun-Chieh Wang³, Hsin-Hsuan Wu⁴, Yi-Shan Wu⁵ (1. National Chung Hsing Univ. (Taiwan), 2. National Chung Hsing Univ. (Taiwan), 3. National Chung Hsing Univ. (Taiwan), 4. National Chung Hsing Univ. (Taiwan), 5. National Chung Hsing Univ. (Taiwan))

キーワード：SCM, EOT, dc-stress, interface

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