Growth

[LEDIA6-05] Thickness Dependence on Crystallinity of (11-22) AlN Thin Films Fabricated by Sputtering and Annealing Method

*R. Akaike¹, D. Kobayashi², T. Nakamura³, H. Miyake⁴ (1. ORIP, 2. Fac. of Eng., 3. MRPCO, 4. Grad. Sch. of Eng. Mie University)

Semipolar face-to-face annealed sputter-deposited AlN (FFA Sp-AlN) are expected to achieve high crystallinity and light extraction efficiency. We evaluated the thickness dependence of crystallinity on (11-22) FFA Sp-AlN by X-ray diffraction (XRD) method.