OPTICS & PHOTONICS International Congress 2024

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LEDIA2024 » Poster Presentation

LEDIA Poster Session

2024年4月24日(水) 13:30 〜 15:00 Hall A (Pacifico Yokohama Exhibition Hall)

[LEDIAp-01] Demonstration of high aspect ratio etching by Ni mask process for μ-LED monolithic integration

*Haruto Fujii1, Takeyoshi Onuma1, Tomohiro Yamaguchi1, Tohru Honda1 (1. Kogakuin University)

Monolithically integrated μ-LED displays were investigated. The Ni mask process, in which SiO2 and Ni were deposited on the GaN template, realized a high aspect ratio etching without changing etching conditions.

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