^○Xu Bai¹, Ryusuke Nebashi¹, Makoto Miyamura¹, Kazunori Funahashi¹, Koichiro Okamoto¹, Hideaki Numata¹, Noriyuki Iguchi¹, Toshitsugu Sakamoto¹, Munehiro Tada¹ (1. NanoBridge Semiconductor, Inc. (Japan))

^○Alexander- Hanyu Wang¹, Firman Simanjuntak¹, Ruomeng Huang¹, Harold Chong¹, David Thomas¹ (1. Univ. of Southampton (UK))

^○Po Hsiung Huang¹, Y.H. Lin¹, K.H. Chang¹, T.H. Shen¹, R.Y. Lyu¹, K.Y. Lee¹, M.L. Miu¹, E Ray Hsieh¹ (1. National Central University (Taiwan))

^○Soodoo Chae¹, Hojin Kim¹, Nayoung Bae¹, Stephen Mancini², Lior Huli¹, Steven Gueci¹, Dave Hetzer¹, Sitaram Arkalgud¹ (1. TEL Technology Center, America, LLC (United States of America), 2. College of Nanoscale Science and Engineering (United States of America))

^○Yirong Guo¹, Jie Li¹, Pengying Chang¹ (1. Beijing University of Technology (China))

^○Seonuk Jeon¹, Nayeon Kim¹, Eunryeong Hong¹, Hyun Wook Kim¹, Jiyong Woo¹ (1. Kyungpook National Univ. (Korea))