Controlling SiO <sub>2</sub> Thin Film Charge and Interface Defect Density on Germanium

Hanchen Liu

doi:https://doi.org/10.7567/SSDM.2023.E-6-05

講演情報

Oral Presentation

10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

[E-6] Thin films for sensors and gate insulators

2023年9月8日(金) 10:45 〜 12:00 Room E (223, Bldg. 2)

Session Chairs: Mamoru Furuta (Kochi Univ. of Technology), Chih-Yu Chang (TSMC)

11:45 〜 12:00

[E-6-05] Controlling SiO ₂ Thin Film Charge and Interface Defect Density on Germanium

^○Hanchen Liu¹, Toni P Pasanen¹, Oskari Leiviskä¹, Joonas Isometsä¹, Tsun Hang Fung¹, Marko Yli-Koski¹, Mikko Miettinen², Pekka Laukkanen², Ville Vähänissi¹, Hele Savin¹ (1. Aalto Univ. (Finland), 2. Univ. of Turku (Finland))

https://doi.org/10.7567/SSDM.2023.E-6-05

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講演情報

[E-6] Thin films for sensors and gate insulators

[E-6-05] Controlling SiO 2 Thin Film Charge and Interface Defect Density on Germanium

パスワード

[E-6-05] Controlling SiO ₂ Thin Film Charge and Interface Defect Density on Germanium