2023 International Conference on Solid State Devices and Materials

講演情報

印刷

Oral Presentation

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[F-1] Modeling, Simulation and Characterization

2023年9月6日(水) 14:00 〜 15:45 Room F (224, Bldg. 2)

Session Chairs: Satofumi Souma (Kobe Univ.), Hidetoshi Oishi (Sony Semiconductor Solutions Corp.)

14:45 〜 15:00

[F-1-04] The Frequency Response Properties of Interface Traps at the HfO 2/Si Interface Using an Ultrafast DLTS Method

○Luping Wang1, Junkang Li1, Rui Zhang1 (1. Zhejiang Univ. (China))

https://doi.org/10.7567/SSDM.2023.F-1-04

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