Theoretical Study of the Gas-Phase Reaction of Hexachlorodisilane by Thermodynamic Analysis and Kinetics Calculation

Tomoya Nagahashi

doi:https://doi.org/10.7567/SSDM.2023.M-7-01

講演情報

Oral Presentation

11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[M-7] Advanced Materials, Nanofabrication, and Thin Films III

2023年9月8日(金) 13:30 〜 15:15 Room M (431, Bldg. 4)

Session Chairs: Akihiko Kikuchi (Sophia Univ.), Kentaro Watanabe (Shinshu Univ.)

13:30 〜 13:45

[M-7-01] Theoretical Study of the Gas-Phase Reaction of Hexachlorodisilane by Thermodynamic Analysis and Kinetics Calculation

^○Tomoya Nagahashi^1,2, Hajime Karasawa², Ryota Horiike², Kenji Shiraishi^1,3 (1. Nagoya Univ. (Japan), 2. KOKUSAI ELECTRIC (Japan), 3. IMaSS (Japan))

https://doi.org/10.7567/SSDM.2023.M-7-01

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講演情報

[M-7] Advanced Materials, Nanofabrication, and Thin Films III

[M-7-01] Theoretical Study of the Gas-Phase Reaction of Hexachlorodisilane by Thermodynamic Analysis and Kinetics Calculation

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