Enhancement of the Polarization Properties in Thin Ferroelectric Hf 0.5Zr 0.5O 2 Films by Two-Step Flash Lamp Annealing

Hideaki Tanimura

doi:https://doi.org/10.7567/SSDM.2023.M-7-04

講演情報

Oral Presentation

11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[M-7] Advanced Materials, Nanofabrication, and Thin Films III

2023年9月8日(金) 13:30 〜 15:15 Room M (431, Bldg. 4)

Session Chairs: Akihiko Kikuchi (Sophia Univ.), Kentaro Watanabe (Shinshu Univ.)

14:15 〜 14:30

[M-7-04] Enhancement of the Polarization Properties in Thin Ferroelectric Hf _0.5Zr _0.5O ₂ Films by Two-Step Flash Lamp Annealing

^○Hideaki Tanimura¹, Yuto Ota², Hikaru Kawarazaki¹, Shinichi Kato¹, Takumi Mikawa¹, Yasuo Nara² (1. SCREEN Semiconductor Solutions Co., Ltd. (Japan), 2. Univ. of Hyogo (Japan))

https://doi.org/10.7567/SSDM.2023.M-7-04

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講演情報

[M-7] Advanced Materials, Nanofabrication, and Thin Films III

[M-7-04] Enhancement of the Polarization Properties in Thin Ferroelectric Hf 0.5Zr 0.5O 2 Films by Two-Step Flash Lamp Annealing

パスワード

[M-7-04] Enhancement of the Polarization Properties in Thin Ferroelectric Hf _0.5Zr _0.5O ₂ Films by Two-Step Flash Lamp Annealing