Ultra-High Concentration Doping by Excimer Laser Annealing Using Solid-Diffusion Source

Ren Aoki

講演情報

Short Oral Presentation

11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[SO-PS-11] 11: Advanced Materials: Synthesis / Crystal Growth / Characterization

2023年9月7日(木) 13:30 〜 14:10 Room M (431, Bldg. 4)

Session Chairs: Shingo Ogawa (Toray Research Center, Inc.), Taizoh Sadoh (Kyushu Univ.)

13:46 〜 13:48

[SO-PS-11-09] Ultra-High Concentration Doping by Excimer Laser Annealing Using Solid-Diffusion Source

^○Ren Aoki¹, Keita Katayama¹, Daisuke Nakamura¹, Hisato Yabuta¹, Hiroshi Ikenoue¹, Taizoh Sadoh¹ (1. Kyushu Univ. (Japan))

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講演情報

[SO-PS-11] 11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[SO-PS-11-09] Ultra-High Concentration Doping by Excimer Laser Annealing Using Solid-Diffusion Source

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