09:00 〜 09:20
[17C-T4-01] Process Exploration of Preparing Large-Sized Uniformly Composed Mo Alloy Sputtering Target via Hot Isostatic Pressing
キーワード:Hot isostatic pressing, large-sized sputtering target, density, powder metallurgy
Mo alloy sputtering target samples were prepared using Mo powder, Ni powder, Ti powder and Ni-Ti alloy powder as raw materials by hot isostatic pressing. Density, phase composition, microstructure and element distribution of Mo-Ti, Mo-Ni-Ti sputtered target samples were measured by OM, SEM and EDS. The experimental results show that hot isostatic pressing can prepare large-sized Mo alloy target at lower temperature, and the obtained samples have finer grains, higher density and more uniform element distribution than that of non-pressure sintering. Mo-Ti, Mo-Ni-Ti sputtering targets (Purity>99.95%, density>99%, particle size<100 μm, component deviation<2 wt%) were obtained by hot isostatic pressing.