International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 26 (IDW '19)

Proceedings of the International Display Workshops Volume 26 (IDW '19)

2019年11月27日 〜 2019年11月29日
Sapporo Convention Center

16:00 〜 16:20

[FMC8-4] Photosensitive Materials with Zirconia Nanotechnology

*Hiroki Chisaka1, Kouichi Misumi1, Dai Shiota1, Katsumi Ohmori1, Lei Zheng2, Robert J. Wiacek2, Z. Serpil Gonen Williams2 (1. Tokyo Ohka Kogyo Co., Ltd. (Japan), 2. Pixelligent Technologies LLC (United States of America))

High reflective index (HRI), Zirconia (ZrO2), Flexible, Photo-patternenable, Inkjet

https://doi.org/10.36463/idw.2019.0679

The combination of ZrO2 nanocrystals and photosensitive technologies led to new photosensitive materials and inks with high refractive index and inkjet properties superior to conventional materials. Moreover, high resolution and high transparency was achieved even with thick films. This material is useful for next generation applications such as flexible displays.