International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 26 (IDW '19)

Proceedings of the International Display Workshops Volume 26 (IDW '19)

2019年11月27日 〜 2019年11月29日
Sapporo Convention Center

10:40 〜 13:10

[FMCp3-6] High Resolution Technologies of 1.0 µm L/S Using PSM Specialized in DUV Broadband Illumination

*Kanji Suzuki1, Manabu Hakko1, Miwako Ando1, Koichi Takasaki1, Nobuhiko Yabu1, Kouhei Nagano1, Nozomu Izumi1 (1. Canon Inc. (Japan))

Lithography, FPD, High resolution, DUV, Phase shift mask

https://doi.org/10.36463/idw.2019.0713

To meet the demands for high resolution, we designed a PSM specialized in DUV broadband illumination and evaluated resolution performance with the PSM. In this paper, we present the ability of 1.0 μm L/S pattern resolution with our PSM based on simulation results and exposure test results.