International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 28 (IDW '21)

Proceedings of the International Display Workshops Volume 28 (IDW '21)

2021年12月1日 〜 2021年12月3日
Virtual Conference

17:50 〜 18:10

[FMC7/AIS9-3] Development of Highly Heat-Resistant, Dry-Etchable Blackening Film for TFT Wiring

*Daisuke Kaneko1、Keita Umemoto1、Hiromi Nakazawa1、Shin Okano1、Yukiya Sugiuchi1、Takeshi Ohtomo1 (1.Mitsubishi Materials Corporation (Japan))

LTPS-TFT, Low reflectivity, Blackening, heat-resistance, dry-etch

https://doi.org/10.36463/idw.2021.0254

We developed blackening material to enhance the heat resistance targeting to LTPS TFTs wiring. Moreover, we investigated the influence of deposition conditions for film properties. Lastly, we also discussed properties of TFT when the blackening material applied to not only the gate electrode but also source/drain electrode.