International Display Workshops General Incorporated Association

13:20 〜 13:40

[MEET1-2 (Invited)] EUV Lighting with C-Beam Irradiation Technique for Ultra-High-Resolution Devices

*Kyu Chang Park1、Sung Tae Yoo1 (1.Kyung Hee University (Korea))

EUV, Ultra-high-resolution, Lithography, Carbon nanotubes, C-beam

https://doi.org/10.36463/idw.2022.0848

High-resolution lithography is required for ultra-high-resolution pixel of next-generation display devices. For high-resolution lithography, EUV lighting, a lighting technology using carbon nanotube (CNT)-based cold cathode electron beam (C-beam), was studied. In addition, the possibility of high-resolution lithography was confirmed by using polymethyl methacrylate (PMMA) as a photoresist.