[A-6-7] Growth parameter and growth model of stripe-shaped large grained silicon on insulator by electron beam annealing
Kenji Shibata、Tomoyasu Inoue、Yamichi Ohmura、Masahiro Kashiwagi
(1.Toshiba Research and Development Center, Toshiba Corporation)
https://doi.org/10.7567/SSDM.1982.A-6-7