[C-5-2] Photo-Conductive, Low Impurity-Diffusive, Heat-Resisting a-Si Formed by Glow-Discharged Decomposition of SiF2 and H2 Mixture
Hideki MATSUMURA、Seijiro FURUKAWA
(1.Dept. of Applied Electronics, Tokyo Institute of Technology)
https://doi.org/10.7567/SSDM.1982.C-5-2