Formation of Si Epi./MgO･Al2O3 Epi./SiO2/Si and Its Epitaxial Film Quality

Masao Mikami; Yasuaki Hokari; Koji Egami; Hideki Tsuya; Masaru Kanamori

doi:https://doi.org/10.7567/SSDM.1983.A-2-3

1983 Conference on Solid State Devices and Materials

1983年8月30日〜 1983年9月1日
The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-2-3] Formation of Si Epi./MgO･Al2O3 Epi./SiO2/Si and Its Epitaxial Film Quality

Masao Mikami、Yasuaki Hokari、Koji Egami、Hideki Tsuya、Masaru Kanamori (1.Fundamental Research Laboratories and Microelectronics Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.1983.A-2-3

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