[A-5-9LN] EVALUATION OF NEW NEGATIVE PHOTORESIST, LMR-UV, BY G-LINE WAFER STEPPERS

Y. YAMASHITA, R. KAWAZU, T. ITOH, K. KAWAMURA, S. OHNO, T. ASANO, K. KOBAYASHI, AND G. NAGAMATSU (1.Research Laboratory, Oki Electric Industry Co., Ltd., 2.Fuji Chemicals Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1985.A-5-9LN