[C-3-3] Formation of Buried Isolation Layer by Implanting Focused B Ion Beam in GaAs Multilayer Using FIBI-MBE System
Hiroshi Arimoto, Tetsuo Morita, Akira Takamori, Yasuo Bamba, Eizo Miyauchi, Hisao Hashimoto
(1.Optoelectronics Joint Research Laboratory)
https://doi.org/10.7567/SSDM.1986.C-3-3
