Thermally Stable TiSi2 Thin Films by Modification in Interface and Surface Structures

[A-1-1] Thermally Stable TiSi2 Thin Films by Modification in Interface and Surface Structures

A. Ohsaki、J. Komori、T. Katayama、M. Shimizu、T. Okamoto、H. Kotani、S. Nagao (1.LSI Research and Development Laboratory Mitsubishi Electric Corporation)