[C-10-4] The Chemical Bonding Features of Fluorine and Boron in BF2+ Ion Implanted Si
T. Kinoshita, M. Takakura, S. Miyazaki, S. Yokoyama, M. Koyanagi, M. Hirose
(1.Department of Electrical Engineering, Hiroshima University, 2.Research Center for Integrated Systems, Hiroshima University)
https://doi.org/10.7567/SSDM.1990.C-10-4