[C-2-5] Thin Nitrided SiO2 Films for EEPROMs

M. DUTOIT、E. GOIN、N. NOVKOVSKI、I. AIZENBERG、J. MANTHEY、J. SOLO DE ZALDIVAR (1.Swiss Federal Institute of Technology、2.Faselec)

https://doi.org/10.7567/SSDM.1990.C-2-5