[LN-D-6] Novel Dry Cleaning Using Si3H8 with the New Single-Wafer Reactor

H. Miyata、A. Tsukune、F. Mieno、Y. Furumura、H. Tsuchikawa (1.BASIC PROCESS DEVELOPMENT DIV. ELECTRONIC DEVICES GROUP FUJITSU LTD.)

https://doi.org/10.7567/SSDM.1990.LN-D-6