[S-V-1] Advanced Si-Surface Preparation Techniques for Improved Gate Oxide Integrity

Marc M. HEYNS、Marc MEURIS、Steven VERHAVERBEKE、Paul W. MERTENS、Ara PHILIPOSSIAN、Dieter GRAF、Anton SCHNEGG (1.IMEC、2.Digital Equipment Corporation、3.Wacker-Chemitronic)

https://doi.org/10.7567/SSDM.1992.S-V-1