[PA4-2] Novel Microdoped Al Alloys for Highly Reliable Thin Film Interconnects

A. N. Priymak (1.Institute of Microelectronics Technology Problems & High Purity Materials, Russian Academy of Science)

1992 International Conference on Solid State Devices and Materials |PDF Download

[PA4-3] Influence of Interface Structure between Overlayer TiN and Al on Multilayered Interconnects

Makiko Kageyama, Yasuyuki Tatara, Hiroshi Onoda (1.VLSI R&D Center, Oki Electric Industry Co., Ltd.)

1992 International Conference on Solid State Devices and Materials |PDF Download

[PA4-4] 0.4 μm Contact with Lower Resistivity Metallization Technology for ULSI Applications

M. Sekine, N. Itoh, T. Akimoto, T. Shinmura, D. T. C. Huo, Y. Kakuhara, K. Kajiyana, Y. Yamada, K. Yamazaki, Y. Murao (1.VLSI Development Division NEC Corporation, 2.AT&T Bell Laboratories)

1992 International Conference on Solid State Devices and Materials |PDF Download

[S-V-1] Advanced Si-Surface Preparation Techniques for Improved Gate Oxide Integrity

Marc M. HEYNS, Marc MEURIS, Steven VERHAVERBEKE, Paul W. MERTENS, Ara PHILIPOSSIAN, Dieter GRAF, Anton SCHNEGG (1.IMEC, 2.Digital Equipment Corporation, 3.Wacker-Chemitronic)

1992 International Conference on Solid State Devices and Materials |PDF Download

[S-V-2] XPS Characterization of SiO2/Si Interfaces

Takeo HATTORI (1.Department of Electronic Engineering, Musashi Institute of Technology)

1992 International Conference on Solid State Devices and Materials |PDF Download

[S-V-3] Ultra Clean Surface Preparation Using Ozonized Ultrapure Water

Tatsuhiko Isagawa, Masahiko Kogure, Takashi Imaoka, Tadahiro Ohmi (1.Department of Electronics, Tohoku University)

1992 International Conference on Solid State Devices and Materials |PDF Download

[S-V-4] STM Study of Thermal Oxidation Process on Si(111) 7×7 Surfaces

Yukinori ONO, Michiharu TABE (1.NTT LSI Laboratories)

1992 International Conference on Solid State Devices and Materials |PDF Download

[S-V-5] A Novel Contactless and Nondestructive Measurement Method of Surface Recombination Velocity on Silicon Surfaces by Photoluminescence

Toshiya SAITOH, Youichiro NISHIMOTO, Takayuki SAWADA, Hideki HASEGAWA (1.Research Center for Interface Quantum Electronics and Department of Electrical Engineering Hokkaido University)

1992 International Conference on Solid State Devices and Materials |PDF Download

[S-V-6] Advanced Low-Temperature Processing of Gate Oxide for ULSI Fabrication

R. J. Markunas, S. V. Hattangady, G. G. Fountain, R. G. Alley, G. Lucovsky (1.Research Triangle Institute, 2.North Carolina State University)

1992 International Conference on Solid State Devices and Materials |PDF Download

[S-V-7] The Selective Growth of LPCVD-Si3N4 on Cleaned Si Surface

N. Inoue, M. Itoh, H. Tamura, N. Hirashita, M. Yoshimaru (1.VLSI Research and Development Laboratory OKI Electric Industry Co., Ltd.)

1992 International Conference on Solid State Devices and Materials |PDF Download