[C-7-3] The Surface Reaction Rate for Silane on Polycrystalline Silicon Obtained by Using a Fast Wafer-Rotating Reactor

Yuusuke Sato, Naoki Tamaoki, Toshimitsu Ohmine (1.Toshiba R&D Center)

https://doi.org/10.7567/SSDM.1993.C-7-3