[LC-8] A-Si:H TFTs Fabricated with Gated rf-discharge Plasma-CVD Technology

Kazushige Takechi、Hiroyuki Uchida、Hiroshi Hayama Akira Kodama、Yoshimi Watabe (1.Functional Devices Research Laboratories, NEC Corporation、2.3rd Thin Film Engineering Division, ANELVA Corporation)

https://doi.org/10.7567/SSDM.1993.LC-8