[PC-1-9] HF/CH30H(Alcohol) Vapor Cleaning <HAVC> and Its Application to Polycrystalline Silicon/Silicon Contact Formation

A. Izumi、T. Matsuka、K. Miya、T. Takeuchi、A. Yamano J. Tsuchimoto、H. Itoh、H. Abe (1.Development Department 2, Dainippon Screen Mfg. Co. Ltd.、2.LSI Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1993.PC-1-9