[LD-12] Oxygen Precipitate Density Control in CZ-Si Wafers by Hydrogen Annealing Process

K. Izunome、H. Shirai、K. Kashima、J. Yoshikawa、A. Hojo (1.Toshiba Ceramics R&D Center、2.Toshiba Ceramics Silicon Division)

https://doi.org/10.7567/SSDM.1994.LD-12