[A-4-6] Initial Stage of Oxidation of Si(001)-2x1 Surface Studied by X-Ray Photoelectron Spectroscopy

Yoshinao Harada、Masaaki Niwa、Takaharu Nagatomi、Ryuichi Shimizu (1.ULSI Process Technology Development Center, Matsushita Electronics Corp.、2.Faculty of Engineering, Osaka University)

https://doi.org/10.7567/SSDM.1998.A-4-6