[A-2-4] Copper Ion Drift Rates in Porous Methylsilsesquiazane Dielectric Films

S. Mukaigawa、T. Oda、T. Aoki、Y. Shimizu、T. Kikkawa (1.Research Center for Nanodevices and Systems, Hiroshima University、2.Tonen Corporation)

https://doi.org/10.7567/SSDM.2000.A-2-4