[A-5-1] Ultra-Thin Silicon Oxynitride Film Grown at Low-Temperature by Microwave-Excited High-Density Kr/O2/N2 Plasma

Kazuo Ohtsubo、Yuji Saito、Katsuyuki Sekine、Masaki Hiramaya、Shigetoshi Sugawa、Herzl Aharoni、Tadahiro Ohmi (1.Department of Electronic Engineering, Graduate School of Engineering, Tohoku University、2.At leave from the Department of Electrical and Computer Engineering, Ben-Gurion University、3.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2000.A-5-1