[B-10-4] The Atomistic Origin of High Dielectric Constants of Ta2O5 Thin Film Deposited on Ru Electrodes
Tomoyuki Hamada、Takuya Maruizumi、Masahiko Hiratani
(1.Advanced Research Laboratory, Hitachi Ltd.、2.Central Research Laboratory, Hitachi, Ltd.)
https://doi.org/10.7567/SSDM.2001.B-10-4