[B-6-1] Interfacial Silicon Emission in Dry Oxidation -the Effect of H and Cl
Masashi Uematsu, Hiroyuki Kageshima, Kenji Shiraishi
(1.NTT Basic Research Laboratories, 2.Institute of Physics, Tsukuba University)
https://doi.org/10.7567/SSDM.2001.B-6-1