[B-6-1] Interfacial Silicon Emission in Dry Oxidation -the Effect of H and Cl Masashi Uematsu、Hiroyuki Kageshima、Kenji Shiraishi (1.NTT Basic Research Laboratories、2.Institute of Physics, Tsukuba University) https://doi.org/10.7567/SSDM.2001.B-6-1