[P3-8] Novel Nickel Silicide Formation Technique for Sub-50nm MOS Device Application

JeoungChill Shim、Chang-woo Lee、Takeshi Sakaguchi、Hyuckjae Oh、Hoon Choi、Hiroyuki Kurino、Mitsumasa Koyanagi (1.Dept. of Machine Intelligence and Systems Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.2002.P3-8