[D-9-2] Chemical Structures of HfO2/Si Interfacial Transition Layer

H. Nohira、Y. Takata、K. Kobayashi、M. B. Seman、S. Joumori、K. Nakajima、M. Suzuki、K. Kimura、Y. Sugita、O. Nakatsuka、A. Sakai、S. Zaima、T. Ishikawa、S. Shin、T. Hattori (1.Musashi Institute of Technology、2.RIKEN/SPring-8、3.JASRI/SPring-8、4.Graduate School of Engineering, Kyoto University、5.Fujitsu Ltd., Akiruno Technology Center、6.Graduate School of Engineering, Nagoya University)

https://doi.org/10.7567/SSDM.2003.D-9-2