Formation of Nickel Self-Aligned Silicide by Using Cyclic Deposition Method

Koichi Terashima; Yoshinao Miura; Nobuyuki Ikarashi; Makiko Oshida; Kenzo Manabe; Takuya Yoshihara; Masayasu Tanaka; Hitoshi Wakabayashi

doi:https://doi.org/10.7567/SSDM.2004.B-3-2

[B-3-2] Formation of Nickel Self-Aligned Silicide by Using Cyclic Deposition Method

Koichi Terashima、Yoshinao Miura、Nobuyuki Ikarashi、Makiko Oshida、Kenzo Manabe、Takuya Yoshihara、Masayasu Tanaka、Hitoshi Wakabayashi (1.System Devices Research Laboratories, NEC Corporation、2.R&D Support Center, NEC Corporation)

https://doi.org/10.7567/SSDM.2004.B-3-2

2004 International Conference on Solid State Devices and Materials

[B-3-2] Formation of Nickel Self-Aligned Silicide by Using Cyclic Deposition Method