The Japan Society of Applied Physics

[P2-3] Infrared Complex Dielectric Function Analysis for Chemical Bonding Structure of Porous Silica Low Dielectric Constant Films

Syozo Takada、Nobuhiro Hata、Shingo Hishiya、Nobutoshi Fujii、Takahiro Nakayama、Takamaro Kikkawa (1.ASRC, AIST、2.MIRAI, ASRC-AIST、3.MIRAI, ASET、4.RCNS, Hiroshima University)

https://doi.org/10.7567/SSDM.2005.P2-3