A Novel Statistical Methodology for Sub-100 nm MOSFET Fabrication Optimization and Sensitivity Analysis

Yiming Li; Ying-Shao Chou

doi:https://doi.org/10.7567/SSDM.2005.P3-23L

[P3-23L] A Novel Statistical Methodology for Sub-100 nm MOSFET Fabrication Optimization and Sensitivity Analysis

Yiming Li、Ying-Shao Chou (1.Department of Communication Engineering, National Chiao Tung University、2.Microelectronics and Information Systems Research Center, National Chiao Tung University、3.Institute of Statistics, National Chiao Tung University)

https://doi.org/10.7567/SSDM.2005.P3-23L

2005 International Conference on Solid State Devices and Materials

[P3-23L] A Novel Statistical Methodology for Sub-100 nm MOSFET Fabrication Optimization and Sensitivity Analysis