[P8-4] High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells using Very High Frequency Plasma at Atmospheric Pressure

Hiroaki Kakiuchi、Hiromasa Ohmi、Yasuhito Kuwahara、Mitsuhiro Matsumoto、Yusuke Ebata、Kiyoshi Yasutake、Kumayasu Yoshii、Yuzo Mori (1.Department of Precision Science and Technology, Graduate School of Engineering, Osaka University、2.SANYO Electric Co., Ltd.、3.SHARP Co., Ltd.)

https://doi.org/10.7567/SSDM.2005.P8-4