Determination of mechanical properties of porous silica low-k films on Si substrates using orientation dependence of surface acoustic wave

Toshinori Takimura; Nobuhiro Hata; Syozo Takada; Takenobu Yoshino

doi:https://doi.org/10.7567/SSDM.2007.C-9-5

2007 International Conference on Solid State Devices and Materials

2007年9月18日〜 2007年9月21日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[C-9-5] Determination of mechanical properties of porous silica low-k films on Si substrates using orientation dependence of surface acoustic wave

Toshinori Takimura、Nobuhiro Hata、Syozo Takada、Takenobu Yoshino (1.Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Science and Technology (AIST))

https://doi.org/10.7567/SSDM.2007.C-9-5

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