[P-1-19] UV-VIS Raman Characterization of High Dose Ultra Shallow Implanted Silicon before and after Excessive Annealing

T. Sasaki, H. Minami, K. Kisoda, W. S. Yoo, M. Yoshimoto, H. Harima (1.Kyoto Institute of Technology, 2.Wakayama University, 3.WaferMasters, Inc.)

https://doi.org/10.7567/SSDM.2007.P-1-19