[P-1-20] Activation of Implanted Phosphorus Atoms in Silicon Wafers by Infrared Semiconductor Laser Annealing Using Carbon Films as Optical Absorption Layers

Naoki Sano, Toshiyuki Sameshima, Yasuhiro Matsuda, Yasunori Andoh (1.Hightec Systems Corporation, 2.Tokyo University of Agriculture and Technology, 3.Nissin Ion Equipment Co., Ltd)

https://doi.org/10.7567/SSDM.2007.P-1-20