[P-11-11] Novel inorganic pH-insensitive membrane prepared by post N2O plasma treatment on conventional Si3N4/SiO2 stack layer for REFET application

Ti-Chuan Wang、Tseng-Fu Lu、Chi-Hang Chin、Cheng-En Lue、Chia-Ming Yang、Yu-Ching Fang、Li Hsu、Hui-Chun Wang、Chao-Sung Lai (1.Department of Electronic Engineering, Chang Gung University、2.Chung-Shan Institute of Science & Technology, Materials & Electro-Optics Research Division)

https://doi.org/10.7567/SSDM.2007.P-11-11