[C-9-1] In Situ Analysis of Plasma-Induced Modification on Porous SiOCH Films

H. Yamamoto¹、K. Asano¹、K. Ishikawa¹、K. Takeda¹、H. Kondo¹、M. Sekine¹、M. Hori¹ (1.Nagoya Univ. , Japan)

https://doi.org/10.7567/SSDM.2011.C-9-1