[P-9-13] Electrical Characteristics and TDDB Reliability of ZrO₂/Al₂O₃/ZrO₂ Stack High-k Gate Dielectric

C. L. Lin¹, S. C. Wu¹, C. C. Tang¹, M. Y. Li² (1.Feng Chia Univ., 2.ProMOS Tech. Inc. , Taiwan)

https://doi.org/10.7567/SSDM.2011.P-9-13