Low-temperature Crystallization of a-Si, a-Ge and a-Si<sub>1-x</sub>Ge<sub>x</sub> Films by Soft X-ray Irradiation

A. Heya; S. Kino; N. Matsuo; K. Kanda; S. Miyamoto; S. Amano; T. Mochizuki; K. Toko; T. Sadoh; M. Miyao

doi:https://doi.org/10.7567/SSDM.2012.I-2-5

2012 International Conference on Solid State Devices and Materials

2012年9月25日〜 2012年9月27日
Kyoto International Conference Center, Kyoto, Japan

[I-2-5] Low-temperature Crystallization of a-Si, a-Ge and a-Si_1-xGe_x Films by Soft X-ray Irradiation

A. Heya¹、S. Kino¹、N. Matsuo¹、K. Kanda²、S. Miyamoto²、S. Amano²、T. Mochizuki²、K. Toko³、T. Sadoh³、M. Miyao³ (1.Univ. of Hyogo、2.LASTI, Univ. of Hyogo、3.Kyushu Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.I-2-5

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2012 International Conference on Solid State Devices and Materials

[I-2-5] Low-temperature Crystallization of a-Si, a-Ge and a-Si1-xGex Films by Soft X-ray Irradiation

[I-2-5] Low-temperature Crystallization of a-Si, a-Ge and a-Si_1-xGe_x Films by Soft X-ray Irradiation