The Japan Society of Applied Physics

[J-1-3] Effect of Gate Insulator Material on Dynamic On-Resistance in GaN MIS-HEMT on 6-inch Si

S. Akiyama1、Y. Watanabe1、T. Wakabayashi1、K. Nukui1、Y. Kotani1、T. Ogino1、T. Hosoda1、M. Kanamura2、K. Joshin2、T. Kikkawa2 (1.Fujitsu Semiconductor Ltd.、2.Fujitsu Labs. (Japan))

https://doi.org/10.7567/SSDM.2013.J-1-3