[N-6-3] Novel Silicon Surface Passivation by Al₂O₃/ZnO/Al₂O₃ Films Prepared by Atomic Layer Deposition

K.S. Jeong¹、S.H. Kim¹、H.R. Lee¹、K.M. Han²、H.Y. Park²、H.D. Lee¹、G.W. Lee¹ (1.Chung-nam National Univ.、2.Solar team, DMS (Korea))

https://doi.org/10.7567/SSDM.2013.N-6-3